PACVD stands for Plasma-Assisted Chemical Vapor Deposition.
On introducing a gas containing the coating elements, a gas discharge occurs in the process chamber. This creates carbon and hydrogen atoms that form a dense coating on the tools and components. Varying the applied voltage it influences the coating properties.
Whereas in a CVD coating process the temperatures are elevated, in PACVD the plasma (made up of positively charged ions and unbound electrons) starts the chemical energy and keeps low temperatures.
Whereas the thermal Chemical Vapor Deposition (CDV) could have disadvantages, PACVD coating process resists to abrasive corrosion more than PVD techniques. Difficulties could be found in presence of small-sized holes and grooves.
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